Sputtering targets
Precious metal sputtering targets are used as expendable materials for deposition of coatings on various surfaces by magnetron sputtering.
Applications: coatings for low-E float-glass; in instrument engineering; in the manufacture of crystals for power electronics, transistors; in the manufacture of household products, such as razor blades.
EZOCM JSC produces sputtering targets of various shapes and dimensions made of following metals and alloys: Ag99.99 according to state standard GOST 6836-2002; Pd99.9 according to GOST 13462-2010; Au99.99 according to state standard GOST 6835-2002; Ir99.9 according to state standard GOST 13099-2006; Rh99.9 according to state standard GOST 13098-2006; Ru99.9 according to technical specifications TU 1995-475-00195200-2006; Pt99.93 according to state standard GOST 13498-2010; bimetallic bonded targets of the "silver-copper", "gold-copper" systems. Upon agreement, targets can be made of other materials.
Sputtering targets can be manufactured both according to the catalog of technical specifications TU 1995-475-00195200-2006 and according to the customer's drawings. Plant produces targets with a grain size of up to 50 microns on palladium targets and up to 80 microns on silver targets. Following the global best practices, EZOCM JSC constantly improves production technologies.
For further details, please contact us.
To place an order, kindly provide information as below:
| Category | Product | Required information | Order quantity |
| Technical products | Other technical products | 1. Alloy, contents of major alloy components; 2. Product number or product drawing. 3. Unit pricing (per 1 gram of alloy/per piece; counting per piece) | Required quantity, unit of measurement |