Iridium sputtering targets
Application: for coatings of elements of microelectromechanical systems (MEMS), in the production of electronic components, such as resonators, LED electrodes.
Materials: iridium Ir99.9 in accordance with state standard GOST 13099-2006
Regulatory document: technical specifications TU 1995-475-00195200-2006*
* Upon an agreement sputtering targets can be manufactured in accordance with customer's drawings.
Dimensions:
Sputtering target type | Thickness, mm | Width, mm | Length, mm | Diameter, mm |
---|---|---|---|---|
Planar | 0.1-6.5 | 10-170 | 10-400 | - |
Round | 0.1-6.5 | - | - | 10-170 |
Maximum mass of a sputtering target: 5 kg |
For more information about sputtering targets made of other precious metals and their alloys click here.
For further details, please contact us.
To place an order, kindly provide information as below:
Category | Product | Required information | Order quantity |
Semi-finished products | Flat-rolled products (strip, foil, ribbon); other semi-finished products (discs, rings) | 1. Alloy, contents of major alloy components; 2. Geometry dimensions; 3. Condition: hard (unannealed) / soft (annealed). | Required quantity, unit of measurement |