Sputtering targets

    Planar sputtering targets

     

    Applications: for magnetron sputtering, incl. for coating low-E float glass

    Regulatory document: technical specifications TU 1995-475-00195200-2006 *

    * Upon agreement, sputtering targets can be made of other alloys and in accordance with customer’s drawings

    Materials and dimensions:

     
    MaterialGrain size, min, mmThickness, mm Width, mm Length, mm
    MinMaxMinMaxMin  Max
    Silver0.080.1351035010650
    Gold 20
    Gold-copper 
    Iridium 200300
    Palladium0.05 10300650
    Platinum 
    Rhodium 3200300

    ** All dimensions are specified for one segment (non-jointed product). Sputtering targets can be made longer and wider by jointing individual elements (segments)

    For further details, please contact us.

    To place an order, kindly provide information as below:

    CategoryProductRequired informationOrder quantity
    Technical productsOther technical products

    1. Alloy, contents of major alloy components;

    2. Product number or product drawing.

    3. Unit pricing (per 1 gram of alloy/per piece; counting per piece)

    		Required quantity, unit of measurement

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